NANYTE Pte. Ltd Hiring! Process Engineering Intern in , Earn up to SGD 1,200 - Ricebowl

Company

NANYTE Pte. Ltd

Designation

Process Engineering Intern

Date Listed

15 Apr 2026

Job Type

Entry Level / Junior Executive

Job Period

Flexible Start, For At Least 2 Months

Profession

Sciences / Laboratory / R&D

Industry

Precision Engineering

Location Name

126 Joo Seng Road, Singapore

Address

126 Joo Seng Rd, Singapore 368355

Map

Allowance / Remuneration

$1,000 - 1,200 monthly

Company Profile

NANYTE designs and manufactures desktop maskless lithography systems used by over 40 research institutions worldwide. Our flagship product, NANYTE BEAM, lets researchers pattern nano- and micro-scale devices directly from a CAD file, in a system compact enough to sit on a lab bench. We are a small, fast-moving team based in Singapore, and we are looking for a process engineering intern to help develop and document lithography recipes for our customers.

Job Description

As a process engineering intern, you will work hands-on with NANYTE BEAM systems to develop, test, and optimize lithography process recipes across a range of photoresists, substrates, and applications. Your recipes will be packaged as ready-to-use guides for our customers — researchers and engineers at universities and labs around the world. You will work directly with the founder and engineering team, gaining deep practical experience in photolithography, microfabrication, and process development.

Responsibilities

Recipe Development

• Develop and optimise exposure recipes for various photoresists (positive and negative, e.g. S1800 series, AZ series, SU-8, ma-N) on different substrates
• Characterise key process parameters: exposure dose, focus offset, development time, pre-/post-bake temperatures, and their effect on feature quality
• Develop recipes for greyscale lithography and 3D microstructure patterning

Testing & Characterisation

• Pattern test structures and evaluate results using optical microscopy and SEM
• Document achievable linewidths, sidewall profiles, and process repeatability for each recipe
• Troubleshoot common lithography issues (underdevelopment, overexposure, adhesion failures, proximity effects)

Documentation & Customer Support

• Write clear, step-by-step process guides that customers can follow to reproduce results
• Create application notes showing example results for specific use cases (e.g. microfluidics channels, MEMS structures, diffractive optical elements)
• Contribute to the NANYTE BEAM user manual and knowledge base
• Assist with customer technical inquiries related to process parameters

Application Instructions

Please apply for this position by submitting your text CV using InternSG.
Kindly note that only shortlisted candidates will be notified.